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Large‑Chamber Dual‑Target Magnetron Sputtering System SSG-200A
Category:
Magnetron Sputtering System
+86 400 8866 090
Telephone:
qhc@shianjia.net
Product Details
Eight Core Features
1. Customizable Sample Chamber
Standard sample chamber: cylindrical, Ø300 mm × 130 mm (height). Custom sizes available.
2. Customizable Sample Stage
Standard sample stage: Ø200 mm circular stage, holds 8‑15 samples, height adjustable up to 40 mm. Other sizes available on request.
3. Integrated Design
Highly integrated – vacuum pump built into the chassis. Compact and elegant benchtop unit.
4. Automated Operation
Equipped with an LED touchscreen. After all parameters are set, simply press “Start Process” for automatic sputtering.
5. Stable Sputtering
Sputtering current is microprocessor‑controlled, safely interlocked and adjustable. Maximum current 500 mA, digital program control.
6. Dual‑Target Design
Dual magnetron sputtering targets for high efficiency, excellent sample compatibility, and no thermal damage.
7. Ultimate Vacuum
Sample chamber ultimate vacuum <0.1 Pa. Working vacuum 0‑10 Pa with constant pressure control. Built‑in two‑stage direct‑drive high‑speed vacuum pump (pumping speed 66 L/min, ultimate vacuum up to 10⁻² Pa).
8. Multiple Target Materials Available
Various targets can be added as options: Au, Pt, Pd, Cu, etc. Size: Ø57 mm × 0.1 mm thick.
Keywords:
Large‑Chamber Dual‑Target Magnetron Sputtering System SSG-200A
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